Will's Blog: A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography (Christopher Mims/Wall Street Journal)

2 March 2026

A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography (Christopher Mims/Wall Street Journal)

Christopher Mims / Wall Street Journal:
A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography — We are now one generation of technological alchemy away from the smallest possible silicon microchips

Posted from: this blog via Microsoft Power Automate.